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Issue Date: October 2002

CATIA Forum to be held in Disneyland

1 October 2002

IBM and Dassault Systemes have announced that the 2002 European CATIA Forum (ECF) will be held from 19-21 November at Disneyland, Paris. With a focus on helping companies advance product development, this year's forum will feature over 80 sessions, including user case studies, Dassault Systemes presentations, demonstrations, workshops, partners sessions, hands-on training and a Technifair.
Participants will include product life cycle management (PLM) experts from IBM, Dassault Systemes, and their partners (Software, Technology and Business), as well as PLM users. Presentations will concentrate on key industry issues, such as industry design, collaboration and integration with supply chain management, and the latest enhancements of the IBM-Dassault Systemes PLM portfolio, comprised of CATIA (product design), ENOVIA, and SMARTEAM (product data management) as well as Dassault Systemes' manufacturing simulation and design application, DELMIA.
"The ECF is designed for our customers. It is a wonderful opportunity for the PLM community to share ideas and also for IBM and Dassault Systemes to receive feedback in order to continually improve our portfolio of products to meet our customers' needs," said Ed Petrozelli, general manager, IBM Product Lifecycle Management. "Many of our customers already experiencing the benefits of PLM will discuss how the implementations of their PLM initiatives have positively impacted their business processes, allowing them to build more innovative products, boost efficiency, reduce time to market, and increase customer satisfaction."
"This is really the year of 3D PLM, and ECF continues to grow as the key flagship event in Europe, where our customers are able to meet face to face with Dassault Systemes Research and Development engineers and executives," said Bernard Charles, president, Dassault Systemes. "The focus of the conference is to help participants become industry leaders by deploying an integrated approach to design, engineering, and manufacturing operations and improving development productivity and innovation."
In addition, a hands-on CATIA V5 session will allow attendees to design a real-world product themselves and, as introduced at last year's ECF, there will be a four-hour in-depth 'ECF Academy' training session to help PLM application users learn advanced functionalities to increase productivity. More than 2500 participants are expected at ECF 2002.
For more information or to register for this event visit www.ecforum.com/</a>.


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